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Anisotropic etching of silicon in a complexant redox alkaline system

Domenii publicaţii > Chimie + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: Carmen MOLDOVAN, Rodica IOSUB, Dan DASCALU, Gheorghe NECHIFOR

Editorial: Elsevier, Sensors and Actuators B:Chemical, 58, p.438-449, 1999.

Rezumat:

This paper presents the results from the investigation of the chemicat anisotropic etching of single-cristal silicon <100> in the following solution: KOH, K3[Fe(CN)6]; K4[Fe(CN)6] and/or complexant added. The complexants added in KOH solution were: calix[n]arene, phenols and ether dibebzo-18-crown-6. The reaction mechanism, the etch rate, the roughness and hillocks are analysed.

Cuvinte cheie: Anisotropic etching, redox systems, organic complexants