Autori: L. Sirghi and Y. Hatanaka

Editorial: Elsevier, Surface Science Letters, 530, p.L323-L327, 2003.

Rezumat:

Abstract
The UV-light-induced hydrophilicity of amorphous titanium dioxide thin films obtained by radio frequency magnetron sputtering deposition was studied in relation with film thickness. The effect of UV light irradiation on the film hydrophilicity was fast, strong and did not depend on substrate or thickness for films thicker than a threshold value of about 12 nm, while for thinner films it was weak and dependent on substrate or thickness. The weak effect of UV light irradiation observed for the ultra-thin films (with thickness less than 12 nm) is explained based on results of measurements of surface topography, UV-light absorption and photocurrent decay in vacuum. Comparing to thicker films, the ultra-thin films have a smoother surface, which diminish their real surface area and density of defects, absorb partially the incident UV light radiation, and exhibit a longer decay time of the photocurrent in vacuum, which proves a spatial charge separation. All these effects may contribute to a low UV light irradiation effect on the ultra-thin film hydrophilicity.

Cuvinte cheie: Sputter deposition, Titanium oxide, Amorphous thin films, Surface electronic phenomena (work function, surface potential, surface states)

URL: http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TVX-4862290-2&_user=10&_handle=W-WA-A-A-AY-MsSAYWA-UUW-AUCVDAUYAU-YUYBWBDY-AY-U&_fmt=summary&_coverDate=05%2F01%2F2003&_rdoc=17&_orig=browse&_srch=%23toc%235546%232003%23994699996%23418053%21&_cdi