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Ti-Si-C thin films produced by magnetron sputtering: correlation between physical properties, mechanical properties and tribological behaviour

Domenii publicaţii > Stiinte ingineresti + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: Cunha, L., Vaz, F., Moura, C., Munteanu, D.,Ionescu, C., Rivière, J.P., E. Le Bourhis

Editorial: American Scientific Publishers, Journal of Nanoscience and Nanotechnology, 10, p.2926-2932, 2010.

Rezumat:

Ti–Si–C thin films were deposited onto silicon, stainless steel and high-speed steel substrates by magnetron sputtering, using different chamber configurations. The composition of the produced films was obtained by Electron Probe Micro-Analysis (EPMA) and the structure by X-ray diffraction(XRD). The hardness and residual stresses were obtained by depth-sensing indentation and substrate deflection measurements (using Stoney’s equation), respectively. The tribological behavior of the produced films was studied by pin-on-disc. The increase of the concentration of non-metallic elements (carbon and silicon) caused significant changes in their properties. Structural analysis revealed the possibility of the coexistence of different phases in the prepared films, namely Ti metallic
phase (-Ti or -Ti) in the films with higher Ti content. The coatings with highest carbon contents, exhibited mainly a sub-stoichiometric fcc NaCl TiC-type structure. These structural changes were also confirmed by resistivity measurements, whose values ranged from 103 /sq for low non-metal concentration, up to 106 /sq for the highest metalloid concentration. Astrong increase of hardness
and residual stresses was observed with the increase of the non-metal concentration in the films.
The hardness (H) values ranged between 11 and 27 GPa, with a clear dependence on both crystalline structure and composition features. Following the mechanical behavior, the tribological results showed similar trends, with both friction coefficients and wear revealing also a straight correlation with the composition and crystalline structure of the coatings.

Cuvinte cheie: Ti–Si–C Coatings, Multifunctional Coatings, Sputtering