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Atom devices based on single dopants in silicon nanostructures

Domenii publicaţii > Fizica + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: D. Moraru, A. Udhiarto, M. Anwar, R. Nowak, R. Jablonski, E. Hamid, J. C. Tardio, T. Mizuno, and M. Tabe

Editorial: Springer Open, Nanoscale Research Letters, 6, p.479, 2011.

Rezumat:

Silicon field-effect transistors have now reached gate lengths of only a few tens of nanometers, containing a countable number of dopants in the channel. Such technological trend brought us to a research stage on devices working with one or a few dopant atoms. In this work, we review our most recent studies on key atom devices with fundamental structures of silicon-on-insulator MOSFETs, such as single dopant transistors, preliminary memory devices, single-electron turnstile devices and photonic devices, in which electron tunneling mediated by single dopant atoms is the essential transport mechanism. Furthermore, observation of individual dopant potential in the channel by Kelvin probe force microscopy is also presented. These results may pave the way for the development of a new device technology, i.e., single-dopant atom electronics.

Cuvinte cheie: atom device, single dopant, SOI-FET, nano

URL: http://www.nanoscalereslett.com/content/6/1/479/abstract