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The influence of substrate temperature on the structure and on the optical reflection spectrum of bismuth thin films

Domenii publicaţii > Fizica + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: S. Condurache-Bota, R. Draşovean, N. Þigãu, A. P. Râmbu

Editorial: Revue Roumaine de Chimie, 56(12), p.1097-1102, 2011.

Rezumat:

Thin films of pure bismuth were deposited by vacuum thermal evaporation onto glass substrates maintained at different temperatures: 27 deg. C, 50 deg. C, 100 deg. C, 150 deg. C and 200 deg.C, respectively. The structure of the obtained films was analyzed by means
of X-ray Diffractometry, with a Shimadzu diffractometer, which operates with a Cu target. The XRD patterns corresponding to a wide angular range proved the polycrystallinity of the bismuth films. Peak indexation was also performed, revealing changes in films’ structures with changing substrate temperature. Grains sizes were estimated by using Scherrer’s formula. The substrate
temperature during the initial deposition also influenced the profile and the values of the optical reflection spectra, which were taken by means of a Perkin Elmer UV-VIS spectrometer, operated between 9000 and 52000 cm-1. Correlations between the optical behavior and the structural changes were inferred.

Cuvinte cheie: bismuthm thin films, thermal evaporation, XRD, reflection spectra