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Preparation and characterization of MOCVD-fabricated TiO2 thin films deposited on titanium for biomedical applications

Domenii publicaţii > Chimie + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: Simona Popescu,Ioana Demetrescu, Alain N. Gleizes

Editorial: Revista de Chimie, 58,9, p.880-884, 2007.

Rezumat:

Abstract – Titanium oxide (TiO2) thin films devoted to biomedical application were obtained using the chemical vapour deposition method. The films were deposited on titanium substrate using a low-pressure reactor with varied precursor molar fractions and deposition temperatures. The influence of these parameters on film properties was studied by scanning electron microscopy images, roughness measuring, X-ray diffraction, contact angle measuring and cyclic polarization tests.

Keywords:

Cuvinte cheie: titanium, TiO2, MOCVD, thin films