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Preparation and characterization of CrNxOy thin films: The effect of composition

Domenii publicaţii > Stiinte ingineresti + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: R. Arvinte, D. Munteanu, J. Borges, R.E. Sousa, N.P. Barradas, E. Alves, F. Vaz, L. Marques

Editorial: Elsevier, Applied Surface Science, 257, p.9120-9124, 2011.


Metallic oxynitrides have attracted the attention of several researchers in the last decade due to their
versatile properties. Through the addition of a small amount of oxygen into a transition metal nitride film,
the material’s bonding states between ionic and covalent types can be tailored, thus opening a wide range
of electrical, optical, mechanical and tribological responses. Among the oxynitrides, chromium oxynitride
(CrNxOy) has many interesting applications in different technological fields. In the present work the
electrical behavior of CrNxOy thin films, deposited by DC reactive magnetron sputtering, were investigated
and correlated with their compositional and structural properties. The reactive gas flow, gas pressure,
and target potential were monitored during the deposition in order to control the chemical composition,
which depend strongly on reactive sputtering process. Depending on the particular deposition parameters
that were selected, it was possible to identify three types of films with different growth conditions and
physical properties. The electrical resistivity of the films, measured at room temperature, was found to
depend strongly on the chemical composition of the samples.

Cuvinte cheie: Chromium oxynitride, electrical resistivity, magnetron sputtering