Scopul nostru este sprijinirea şi promovarea cercetării ştiinţifice şi facilitarea comunicării între cercetătorii români din întreaga lume.
Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the reactive gases flow (gas mixture/acetylene)
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