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Epitaxial growth of ultrathin Cr films on Mo(110) at elevated temperature

Domenii publicaţii > Fizica + Tipuri publicaţii > Articol în revistã ştiinţificã

Autori: A. Cazacu, S. Murphy, and I. V. Shvets

Editorial: Phys. Rev. B, 73, p.045413, 2006.


The principal details of Cr film growth on Mo(110) at elevated temperature are described. Cr films form nanostripes by the step-flow growth mechanism for film coverages up to 3 monolayers. In contrast to the Fe/Mo(110) system, there is no indication of strain relaxation in either the first, second, or third layers. The Cr nanostripes remain pseudomorphic up to the onset of Stranski-Krastanov growth, which is typified by the formation of nanowedge islands. This is accompanied by the formation of a two-dimensional dislocation network within the nanowedge islands. Two types of steps can be observed on top of the Cr nanowedges, unlike the Fe/Mo(110) system where the (110) surface of the Fe nanowedges is unbroken by any steps. The first are monatomic steps formed by incomplete Cr layers, while the second are fractional steps formed between adjacent layers with different degrees of tetragonal distortion. The fractional steps are modeled using the first principles calculations.

©2006 The American Physical Society

Cuvinte cheie: strain relaxation, ultrathin magnetic films, nanowires, nanowedge islads, pattern formation