Optimizing Strontium Ruthenate Thin Films for Near-Infrared Plasmonic Applications
Several new plasmonic materials have recently been introduced in order to achieve better temperature stability than conventional plasmonic metals and control field localization with a choice of plasma frequencies in a wide spectral range. Here, epitaxial SrRuO3 thin films with low surface roughness fabricated by pulsed laser deposition are studied. The influence of the oxygen deposition pressure (20–300 mTorr) on the charge carrier dynamics and
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