Articolele autorului Raluca Tiron
Link la profilul stiintific al lui Raluca Tiron

Continuous evolution of lithographic films through process steps: an example with 193 chemically amplified resists

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193nm resist deprotection study from outgassing measurements by TD-GCMS/FID

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Investigation of fullerene depth distribution in PMMA-C60 blends using dual beam ToF-SIMS

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– Impact of molecular structure of polymer in 193 nm resist performance

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 Hyperbranched polymers for photolithographic applications – towards understanding the relationship between chemical structure of polymer resin and lithographic performances

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Resist evaluation for contact hole patterning with thermal flow process

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Mechanical dynamical analysis of ultra thin resist films for microlithography applications

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Ultrahigh-resolution pattern using electron-beam lithography HF wet etching

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Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process

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Fabrication and characterisation of nanoscale programmed defects for EUV lithography

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